parylene Dry Lift-Off
Researchers developed a parylene-based dry lift-off technique for high-resolution micropatterning of quantum dot (QD) films in optoelectronic devices
The process uses a parylene intermediate layer, applied by chemical vapor deposition, as a buffer for photolithographic patterning
Standard photolithography and plasma etching define the pattern on the parylene layer, which is then mechanically peeled off to remove unwanted QDs
The technique enables QDs to be deposited as the final step, maintaining their narrow emission linewidth and high photoluminescence
Achieved pattern resolutions are as fine as 1 µm, suitable for advanced micro-display and optoelectronic applications
Multi-color patterning is possible by repeating the process with different QD types, enabling integration of red and green QDs on a single substrate
The method was successfully integrated with blue GaN LED substrates, enabling high-resolution QD color converters for displays
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